Simulação pelo método de Monte Carlo cinético dos estágios iniciais do crescimento de filmes finos

Abstract

This work consists in a study of the early stages of growth of metallic thin films over diffeent substrates. For that, computacinal simulations have been done using the kinetic Monte Carlo model, considering the events of atomic deposition, diffusion and re-evaporation. Aiming to analyze the effects of the deposition parameters in the films morphologies, the substrate temperature and the deposition rate were varied. To observe the influence of the substrate material and the metal that has been deposited, different values of interaction energies between the materials have been used. the simulated films roughnesses were calculated, in addition to a qualitative analysis of the shape and distribution of the islands at different film coverages. The results show that, for most cases, higher temperatures leads to larger islands, with more reguar shapes. Also, it was possible to observe that the energies associated to the films and the substrates atoms have a strong nfluence in the film's morphology and growth mode. Moreover, it can be concluded that it is possible to tailor the film's morphology through the studied parameters variation, enabling the control of film's properties during the deposition process.